Liquid discharge head and producing method therefor

Details Liquid discharge head and producing method therefor Liquid discharge head and producing method therefor

2006-05-19

2009-08-25

Vinh, Lan (Department: 1792)

Etching a substrate: processes

Forming or treating thermal ink jet article

C216S080000, C216S099000, C347S047000

Reexamination Certificate

active

07578943

ABSTRACT:
A loss in the rigidity of a substrate for a liquid discharge head having nozzles at a high density can be suppressed. A liquid discharge head includes plural pressure generating chambers respectively provided with pressure generating elements, plural nozzle apertures respectively communicating with the plural pressure generating chambers and adapted to discharge a liquid, and a reservoir with which the plural pressure generating chambers commonly communicate respectively through communicating parts. The pressure generating chambers and the reservoir respectively have recessed portions formed respectively on one and the other of two principal planes of the same substrate, and the reservoir contains a portion shallower than a portion within the reservoir that communicates with the pressure generating chambers.

REFERENCES:
patent: 7213908 (2007-05-01), Chwalek et al.
patent: 2005/0128255 (2005-06-01), Nakanishi
patent: 2005/0140737 (2005-06-01), Ushijima et al.
patent: 2005/0210645 (2005-09-01), Xin-Shan et al.
patent: 2006/0261035 (2006-11-01), Nakanishi
patent: 5-229128 (1993-09-01), None
patent: 10-209113 (1998-08-01), None

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