Liquid crystal programmable photoresist exposure system

Details Liquid crystal programmable photoresist exposure system Liquid crystal programmable photoresist exposure system

1991-03-18

1992-04-14

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Identifying, composing, or selecting

355 71, G03B 2752

Patent

active

051052156

ABSTRACT:
Photoresist layers are rapidly exposed in a pattern determined by electronically stored data by exposure of the photoresist through a high resolution liquid crystal shutter array.

REFERENCES:
patent: 3764211 (1973-10-01), Morse et al.
patent: 3824604 (1974-07-01), Stein

Affiliated with

Also associated with

Rating

Liquid crystal programmable photoresist exposure system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Liquid crystal programmable photoresist exposure system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid crystal programmable photoresist exposure system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2352703