Liquid crystal cells – elements and systems – Particular excitation of liquid crystal – Electrical excitation of liquid crystal
Patent
1997-09-10
1998-12-22
Sikes, William L.
Liquid crystal cells, elements and systems
Particular excitation of liquid crystal
Electrical excitation of liquid crystal
349 46, 438 30, 257595, 257762, G02F 1136, H01L 2993, H01L 2348
Patent
active
058524819
ABSTRACT:
The method of fabricating a liquid crystal display device forms a first and second gate electrode on a first and second region, respectively, of a substrate. The first and second gate electrodes each include a non-anodizing metallic layer and at least one anodizing metallic layer. The two metallic layers also have different etching selection ratios. A first insulating layer is formed on the anodizing metallic layer of the first and second gate electrodes, and at least a second insulating layer is formed over the substrate. A thin film transistor structure, which utilizes the first gate electrode as a gate, is formed on the second insulating layer. The thin film transistor structure includes a semiconductor layer on the second insulating layer over the first gate electrode, an impurity semiconductor layer on first and second portions of the semiconductor layer, and first and second source/drain electrodes on the impurity semiconductor layer covering the first and second portions of the semiconductor layer, respectively. The method further includes the steps of depositing a passivation layer over the substrate, and forming first and second contacts holes. The first contact hole exposes the first source/drain electrode, and the second contact hole exposes the second gate electrode. A pixel electrode is formed on the passivation layer and in contact with the first source/drain electrode and the second gate electrode.
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Chowdhury Tarifur R.
LG Electronics Inc.
Sikes William L.
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