Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2006-12-21
2009-08-25
Hoang, Quoc D (Department: 2892)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C257S059000, C257SE21094, C257SE21104, C257SE21372, C349S043000
Reexamination Certificate
active
07579201
ABSTRACT:
A liquid crystal display device includes a gate line and a data line crossing each other to define a pixel region on a substrate, a gate electrode connected to the gate line, a gate insulating layer on the gate electrode, an active layer on the gate insulating layer, source and drain electrodes on the active layer, spaced apart from each other and each having inner sides that face each other, wherein the source electrode is connected to the data line, ohmic contact layers between the active layer and each of the source and drain electrodes, a shielding pattern over the active layer and having outer sides, wherein at least one of the outer sides faces at least one of the inner sides of the source and drain electrodes, and a pixel electrode in the pixel region and connected to the drain electrode.
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Kim Hyo-Uk
Lim Byoung-Ho
Hoang Quoc D
Holland & Knight LLP
LG Display Co. Ltd.
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