Liquid crystal cells – elements and systems – Particular excitation of liquid crystal – Electrical excitation of liquid crystal
Reexamination Certificate
2011-03-08
2011-03-08
Nelms, David (Department: 2871)
Liquid crystal cells, elements and systems
Particular excitation of liquid crystal
Electrical excitation of liquid crystal
C349S039000, C349S043000
Reexamination Certificate
active
07903184
ABSTRACT:
A method for manufacturing a substrate of a TFT LCD device is disclosed with following steps: providing a transparent substrate having a thin film transistors area and a storing capacitor area; forming an aluminum metal layer and a metal protecting layer on the substrate; patterning a first pattern on the aluminum metal layer of the TFT area, and a second pattern on the metal protecting layer of the storing capacitor area through a halftone mask; forming an aluminum nitride layer on the patterned metal protecting layer; removing the aluminum nitride layer form a rugged surface; forming patterned gates, patterned sources, and patterned drains over the patterned metal protecting layer of the TFT area, and forming a second metal layer over the rugged surface of the aluminum layer on the storing capacitor area, wherein the second metal layer is electrically connected with the drains; and forming patterned pixel electrodes.
REFERENCES:
patent: 2004/0124414 (2004-07-01), Jang et al.
patent: 5216064 (1993-08-01), None
patent: 6067203 (1994-03-01), None
patent: 7013196 (1995-01-01), None
patent: 2004 040075 (2004-02-01), None
Chen Chien-Hung
Chen Li-Kai
Bacon & Thomas PLLC
Chung David Y
Nelms David
Quanta Display Inc.
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