Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2008-03-25
2008-03-25
Hoang, Quoc (Department: 2818)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C257S059000, C257SE21413, C257SE21414
Reexamination Certificate
active
11158000
ABSTRACT:
A method for fabricating a liquid crystal display device includes providing first and second substrates; forming an active layer on the first substrate, wherein the active layer includes a source region, a drain region, a channel region, and a storage region; forming a first insulation layer on the first substrate; forming a gate electrode, a gate line, a pixel electrode, and a storage line on the first substrate, wherein storage line overlaps the storage region; forming a second insulation layer on the first substrate; forming first and second contact holes through the first and second insulation layers, wherein the first and second contact holes expose respective ones of the source and drain regions; forming a pixel hole through the second insulation layer, wherein the pixel hole exposes the pixel electrode; forming a source electrode electrically connected to the source region through the first contact hole and a drain electrode electrically connected to the drain region through the second contact hole; and forming a liquid crystal layer between the first and second substrates.
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Lee Dea Yuu
Park Yong In
Hoang Quoc
LG.Philips LCD Co. , Ltd.
McKenna Long & Aldridge LLP
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