Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2007-10-18
2009-02-10
Smith, Zandra (Department: 2813)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S029000, C438S045000, C438S116000, C438S149000, C438S151000, C438S163000, C438S164000, C438S166000, C438S479000, C438S488000, C438S491000, C257SE21535, C349S042000, C349S043000, C349S044000, C349S139000
Reexamination Certificate
active
07488612
ABSTRACT:
A method for fabricating a liquid crystal display (LCD) device comprises forming an active pattern and a data line on a substrate, the active pattern including a source, a drain, and a channel regions; a first insulation film on a portion of the substrate; forming a gate electrode in a portion of the active pattern where the first insulation film is formed; a second insulation film on the substrate; forming a plurality of first contact holes exposing a portion of the source and drain regions and a second contact hole exposing a portion of the data line; forming a source electrode from a transparent conductive material connected to a source region within the respective first contact hole and a data line within the second contact hole; and forming a pixel and a drain electrodes from the transparent conductive material connected to a drain region within the respective first contact hole.
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Kim Sang-Hyun
Park Yong-In
Yang Joon-Young
LG Dsiplay Co., Ltd.
McKenna Long & Aldridge LLP
Nicely Joseph C
Smith Zandra
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