Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2005-05-18
2008-10-21
Lindsay, Jr., Walter (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S149000, C438S150000, C438S151000, C438S154000, C257SE21412, C257SE21316
Reexamination Certificate
active
07439088
ABSTRACT:
An array substrate for a liquid crystal display device includes a substrate, a gate line and a data line crossing each other to define a pixel region, a thin film transistor at a crossing of the gate and data lines, a metal pattern over the gate line, a passivation layer exposing the substrate in the pixel region, a part of the thin film transistor and a part of the metal pattern, and a pixel electrode in the pixel region. The pixel electrode is connected to the part of the thin film transistor and contacts the part of the metal pattern. The metal pattern has at least one curved portion in a side contacting the pixel electrode.
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Brinks Hofer Gilson & Lione
LG Display Co. Ltd.
Lindsay, Jr. Walter
Mustapha Abdulfattah
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