Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2005-12-02
2008-03-25
Nhu, David (Department: 2818)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S070000, C438S551000, C257SE21183, C257SE21258, C257SE21351
Reexamination Certificate
active
07348198
ABSTRACT:
A liquid crystal display device and a fabricating method thereof for simplifying a process and improving an aperture ratio are disclosed, including forming a first mask pattern group including a gate line, a gate electrode and a common line; forming a second mask pattern group including a semiconductor pattern and a source/drain pattern having a data line, a source electrode and a drain electrode overlapped thereon on the gate insulating film using a second mask; and forming a third mask pattern group including and a pixel electrode making an interface with the protective film in the pixel hole to be connected to the drain electrode, thereby forming a horizontal electric field with the common electrode, using a third mask.
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LG.Philips LCD Co. , Ltd.
McKenna Long & Aldridge LLP
Nhu David
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