Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2011-05-17
2011-05-17
Fahmy, Wael M (Department: 2814)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C257SE21615, C257S223000, C257S227000, C257S291000, C257S292000, C257S439000, C257S655000, C257SE27125, C257SE27112, C257SE29145, C257SE29151, C257SE29147, C438S149000, C438S257000
Reexamination Certificate
active
07943405
ABSTRACT:
A liquid crystal display panel and a fabricating method thereof comprising an image sensing capability, image scanning, and touch inputting. In the liquid crystal display device, a gate line and a data line are formed to intersect each other on a substrate to define a pixel area in which a pixel electrode is positioned. A first thin film transistor is positioned at an intersection area of the gate line and the data line. A sensor thin film transistor senses light having image information and supplied with a first driving voltage from the data line. A driving voltage supply line is positioned in parallel to the gate line to supply a second driving voltage to the sensor thin film transistor.
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Choo Kyo Seop
Kang Hee Kwang
Armand Marc
Fahmy Wael M
LG Display Co. Ltd.
McKenna Long & Aldridge LLP
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