Coating processes – Spraying
Patent
1997-10-20
2000-03-21
Beck, Shrive
Coating processes
Spraying
427420, 427240, 427346, 118 52, 118313, 239296, 239299, 239300, 239424, 239433, B05D 102, B05B 706
Patent
active
060400161
DESCRIPTION:
BRIEF SUMMARY
TECHNICAL FIELD
The present invention relates to a liquid coating nozzle, method for manufacturing it, liquid coating method and liquid coating apparatus. The liquid coating apparatus forms a thin film by applying a coat of liquid on an object to be coated such as a cathode ray tube, a semiconductor substrate, a liquid crystal substrate, and a substrate for an optical disk. The present invention also relates to a method for manufacturing a cathode ray tube as an application of the above-mentioned nozzle.
Specifically, the present invention relates to a nozzle and a color CRT (cathode ray tube) capable of implementing a phosphor surface which has a coating pattern with a uniform quality at a higher level, and providing a high-luminance image.
BACKGROUND ART
For example, three kinds of phosphor picture elements for coloring in red, green, and blue are formed on a phosphor surface of a glass panel inner surface of a cathode ray tube. These picture elements are regularly arranged in a dot or strip manner via a photo-adsorption film which is called a black matrix. In a case where such phosphor picture elements are formed by coating, a liquid coating apparatus is used.
The manufacture of the phosphor surface will be described as follows. First, a photosensitive resin film is formed on a glass panel inner surface of a cathode ray tube. At positions for forming phosphor picture elements in a portion where the photosensitive resin film is formed, a phosphor forming section is manufactured through photo-reactive material coating, exposure, and development. The photolithography technique is used for manufacturing the phosphor forming section. Next, a phosphor suspension (hereinbelow called a slurry) is coated on the panel inner surface. A phosphor forming section of a specific color is manufactured on request through the similar photolithography technique. The coating for forming the phosphor surface of the cathode ray tube is mainly carried out by rotary coating in which the slurry is coated on the panel while rotating the panel.
Such rotating coat is described below. First, a slurry in which a phosphor is suspended in a photosensitive resin is poured in the panel inner surface rotating at a lower speed. The poured slurry is gradually spread on the panel inner surface due to the inclination and rotation of the panel while the phosphor is precipitated. It is important to obtain a uniform coating film without coating nonuniformity in the phosphor coating process. For this purpose, there are already proposed a method of periodically changing the tilting angle of the panel in synchronization with the rotation period of the panel (for example, Japanese Unexamined Patent Publication No. 3-122944) and a method of carrying out the regular and reverse rotations of the panel (for example, Japanese Unexamined Patent Publication No. 5-101775).
Next, the panel is rotated at a higher speed to begin a superfluous liquid shaking-off process. In order to obtain a uniform coating film, it is important to set the tilting angle and the number of revolutions of the panel at the shaking-off operation. Then, there are already proposed a method of shaking-off the panel with the panel located upward diagonally (for example, Japanese Unexamined Patent Publication No. 55-57230) and a method of shaking-off the panel with the panel located downward diagonally (for example, Japanese Unexamined Patent Publication No. 59-186230).
In this process, a superfluous slurry is discharged outside of the panel. Next, the coating film is heated by an external infrared heater to dry it. Then, a shadow mask is set and subjected to exposure to ultraviolet light. The irradiation of the ultraviolet light allows a photo-crosslinking reaction to progress between a photosensitive resin and a photo-initiator while an exposed portion is insolubilized to water. After the exposure, the shadow mask is removed and a development is carried out by a hot water shower etc. to wash out an unexposed portion with water, thereby forming a phosphor pattern only at a required
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Aoki Nobuyuki
Hokazono Nobutaka
Ikeda Junji
Kotani Hiroyuki
Mitani Masato
Barr Michael
Beck Shrive
Matsushita Electric - Industrial Co., Ltd.
Matsushita Electronics Corporation
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