Liquid application method and method of manufacturing electronic

Details Liquid application method and method of manufacturing electronic Liquid application method and method of manufacturing electronic

1996-05-22

1999-05-11

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427 64, 427 72, 427165, 427169, 427261, 427269, 427287, 4273855, 4274072, 427420, 4274432, 427510, 427559, 427595, B05D3/06

Patent

active

059026480

ABSTRACT:
The present invention aims to form a thin coating film of even thickness within a short processing time under a curtailed consumption of coating liquid; where, a gas is spouted from nozzle 4 disposed facing to protection glass 2 of cathode ray tube, and a liquid containing fluorescent material is made to spout accompanied by the spouting gas, to be applied on protection glass 2 by shifting the positioning of protection glass 2 relative to nozzle 4 while spouting the liquid containing fluorescent material.

REFERENCES:
patent: 3578527 (1971-05-01), Sakata et al.
patent: 4514439 (1985-04-01), Rounds
patent: 5429840 (1995-07-01), Raterman et al.

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