Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to attribute – absence or presence of work
Reexamination Certificate
2011-06-21
2011-06-21
Edwards, Laura (Department: 1713)
Coating apparatus
Control means responsive to a randomly occurring sensed...
Responsive to attribute, absence or presence of work
C118S680000, C118S681000, C118S249000, C118S256000, C118S262000, C118S300000, C347S101000, C347S103000
Reexamination Certificate
active
07963245
ABSTRACT:
A liquid application device includes a rotating unit for rotating an application member to apply liquid to a medium in contact with the application member, a liquid application unit including the application member, and a retention member for retaining liquid in a sealed liquid retention space formed to be in contact with the application member. The liquid application unit applies the liquid retained in the liquid retention space to the medium via the application member by rotating the application member. In addition, a control unit controls the rotating unit, wherein the control unit controls, after receiving information of instruction on applying liquid to the medium, the rotating unit to rotate, before the application member contacts the medium, the application member so that the rotating unit performs a preliminary rotation that forms a pool of the liquid in an area. The area is upstream, in a rotational direction, of a contact area between the retention member and the application member at a side where a surface of the application member enters a contact area with the retention member, and the area is downstream, in the rotational direction, of a contact area between the medium and the application member when transferring the medium.
REFERENCES:
patent: 4796528 (1989-01-01), Sarezen
patent: 5628827 (1997-05-01), McCollam et al.
patent: 5850233 (1998-12-01), Otsuka et al.
patent: 6183079 (2001-02-01), Meade et al.
patent: 2003/0024474 (2003-02-01), Suzuki et al.
patent: 2005/0174380 (2005-08-01), Ide et al.
patent: 2005/0179720 (2005-08-01), Iwasaki et al.
patent: 2006/0176325 (2006-08-01), Seki et al.
patent: 2007/0034152 (2007-02-01), Nakagawa et al.
patent: 2007/0035592 (2007-02-01), Oshio et al.
patent: 2007/0035593 (2007-02-01), Iwasaki et al.
patent: 2007/0070163 (2007-03-01), Masuyama et al.
patent: 2007/0126835 (2007-06-01), Oshio et al.
patent: 2007/0126836 (2007-06-01), Masuyama et al.
patent: 0 364 685 (1993-11-01), None
patent: 63-093135 (1988-04-01), None
patent: 63-312149 (1988-12-01), None
patent: 2-172554 (1990-07-01), None
patent: 8-58069 (1996-03-01), None
patent: 09-501608 (1997-02-01), None
patent: 2002-96452 (2002-04-01), None
patent: 2004-181899 (2004-07-01), None
patent: 2006-159670 (2006-06-01), None
Iwasaki Osamu
Masuyama Atsuhiko
Nakagawa Yoshinori
Oshio Naomi
Otsuka Naoji
Canon Kabushiki Kaisha
Edwards Laura
Fitzpatrick ,Cella, Harper & Scinto
LandOfFree
Liquid application device and ink jet recording apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Liquid application device and ink jet recording apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid application device and ink jet recording apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2648924