Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters
Patent
1992-03-13
1993-09-21
Wieder, Kenneth A.
Electricity: measuring and testing
Impedance, admittance or other quantities representative of...
Lumped type parameters
G01R 2726
Patent
active
052472620
ABSTRACT:
A test structure pattern and method for processing the electrical data extracted from the pattern which allows for the measurement of a short line with a precision on the order of 10 nanometers.
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J. Electrochemical Society vol. 125 No. 4 Apr. 1978 Bridge and van der Pauw heet Resistors for Characterizing the Line Width of Conducting Layers Buehler et al.
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Perloff, David S., "A Van der Pauw Resistor Structure for Determining Mask Superposition Errors on Semiconductor Slices", Solid State Electronics, vol. 21, pp. 1013-1015.
Russell, T. J., et al. "A Comparison of Electrical and Visual Alignment Test Structures for Evaluating Photomask Alignment in Integrated Circuit Manufacturing", Technical Digest, Washington, D.C., Dec. 5-7, 1977.
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Allen Richard
Cresswell Michael
Linholm Loren
deAngeli Michael
Regan Maura K.
The United States of America as represented by the Secretary of
Wieder Kenneth A.
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