Linearity measuring apparatus for wafer orientation flat

Details Linearity measuring apparatus for wafer orientation flat Linearity measuring apparatus for wafer orientation flat

2011-03-15

2011-03-15

Bennett, G. Bradley (Department: 2841)

Geometrical instruments

Gauge

With support for gauged article

C033S533000

Reexamination Certificate

active

07905030

ABSTRACT:
Straight tracks are formed in a first direction on a base. The top surface of a platform is formed so as to be flat to mount a wafer having an Ori-Fla, and the platform is moved in the first direction by being engaged with the straight tracks via engagement means. A block having a flat face against which the Ori-Fla of the wafer abuts and which is parallel with the first direction is installed with a first clearance L being provided with the straight track in a second direction perpendicular to the first direction. Wafer fixing means for fixing the wafer in a state in which the wafer is mounted on the platform is provided in the platform, and a measurement device having a probe opposed to the straight track and capable of being displaced in the second direction is installed on the base with a second clearance M being provided with the block in the first direction. When a clearance between the tip end of the probe and the straight track is taken as N, the relationship of 0 μm<L−N≦100 μm exists. By this configuration, the linearity of the Ori-Fla can be measured accurately in a short period of time.

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Mitutoyo Digimatic Indicators, Bulletin No. 1824, Jan. 2005.
http://www.mitutoyo,co,jp/eng/corporate/history/index—03.html (no date).
http://wwwlmytoolstore.com/mitutoyo/575-01.html (no date).

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