Linear semiconductor processing facilities

Material or article handling – Process – Of moving material between zones having different pressures...

Reexamination Certificate

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C414S217000, C414S806000

Reexamination Certificate

active

07959403

ABSTRACT:
Methods and systems are provided for handling materials, including materials used in semiconductor manufacturing systems. The methods and systems include linear semiconductor processing facilities for vacuum-based semiconductor processing and handling, as well as linkable or extensible semiconductor processing facilities that can be flexibly configured to meet a variety of constraints.

REFERENCES:
patent: 3294670 (1966-12-01), Charschan et al.
patent: 3584847 (1971-06-01), Hammond et al.
patent: 3796163 (1974-03-01), Meyer et al.
patent: 3834555 (1974-09-01), Bennington et al.
patent: 3874525 (1975-04-01), Hassan et al.
patent: 3925182 (1975-12-01), Carmichael et al.
patent: 3968018 (1976-07-01), Lane et al.
patent: 4015558 (1977-04-01), Small et al.
patent: 4184448 (1980-01-01), Aichert et al.
patent: 4275978 (1981-06-01), Brooks et al.
patent: 4299533 (1981-11-01), Ohnaka
patent: 4318767 (1982-03-01), Hijikata
patent: 4392776 (1983-07-01), Shum
patent: 4398720 (1983-08-01), Jones et al.
patent: 4433951 (1984-02-01), Koch et al.
patent: 4529460 (1985-07-01), Hasegawa et al.
patent: 4584045 (1986-04-01), Richards
patent: 4666366 (1987-05-01), Davis
patent: 4701096 (1987-10-01), Fisher
patent: 4702668 (1987-10-01), Carlisle et al.
patent: 4712971 (1987-12-01), Fyler
patent: 4724322 (1988-02-01), Knowles et al.
patent: 4730976 (1988-03-01), Davis et al.
patent: 4749465 (1988-06-01), Flint et al.
patent: 4775281 (1988-10-01), Prentakis
patent: 4813732 (1989-03-01), Klem
patent: 4817556 (1989-04-01), Mears et al.
patent: 4825808 (1989-05-01), Takahashi et al.
patent: 4831270 (1989-05-01), Weisenberger
patent: 4875825 (1989-10-01), Tullis et al.
patent: 4909701 (1990-03-01), Hardegen et al.
patent: 4917556 (1990-04-01), Stark et al.
patent: 4951601 (1990-08-01), Maydan et al.
patent: 5013210 (1991-05-01), Bond
patent: 5020475 (1991-06-01), Crabb et al.
patent: 5058526 (1991-10-01), Matsushita et al.
patent: 5064340 (1991-11-01), Genov et al.
patent: 5076205 (1991-12-01), Vowles et al.
patent: 5180275 (1993-01-01), Czech et al.
patent: 5203443 (1993-04-01), Toriumi et al.
patent: 5227708 (1993-07-01), Lowrance
patent: 5234303 (1993-08-01), Koyano
patent: 5259881 (1993-11-01), Edwards et al.
patent: 5286296 (1994-02-01), Sato et al.
patent: 5308431 (1994-05-01), Maher et al.
patent: 5314541 (1994-05-01), Saito et al.
patent: 5333986 (1994-08-01), Mizukami et al.
patent: 5344542 (1994-09-01), Maher et al.
patent: 5377425 (1995-01-01), Kawakami et al.
patent: 5391035 (1995-02-01), Krueger
patent: 5417537 (1995-05-01), Miller
patent: 5426865 (1995-06-01), Ikeda et al.
patent: 5431529 (1995-07-01), Eastman et al.
patent: 5433020 (1995-07-01), Leech, Jr.
patent: 5447409 (1995-09-01), Grunes et al.
patent: 5447431 (1995-09-01), Muka
patent: 5486080 (1996-01-01), Sieradzki
patent: 5511005 (1996-04-01), Abbe et al.
patent: 5534761 (1996-07-01), Crippa
patent: 5538390 (1996-07-01), Salzman
patent: 5539975 (1996-07-01), Kukuljan et al.
patent: 5563798 (1996-10-01), Berken et al.
patent: 5571325 (1996-11-01), Ueyama et al.
patent: 5577879 (1996-11-01), Eastman et al.
patent: 5586585 (1996-12-01), Bonora et al.
patent: 5657553 (1997-08-01), Tarui et al.
patent: 5700127 (1997-12-01), Harada et al.
patent: 5720590 (1998-02-01), Hofmeister
patent: 5740062 (1998-04-01), Berken et al.
patent: 5751003 (1998-05-01), Rose et al.
patent: 5765982 (1998-06-01), Martin et al.
patent: 5765983 (1998-06-01), Caveney et al.
patent: 5810549 (1998-09-01), Wytman
patent: 5820679 (1998-10-01), Yokoyama et al.
patent: 5888048 (1999-03-01), Martin et al.
patent: 5894760 (1999-04-01), Caveney
patent: 5897710 (1999-04-01), Sato
patent: 5899658 (1999-05-01), Hofmeister
patent: 5957651 (1999-09-01), Takebayashi et al.
patent: 5980194 (1999-11-01), Freerks et al.
patent: 5989346 (1999-11-01), Hiroki
patent: 6002840 (1999-12-01), Hofmeister
patent: 6017820 (2000-01-01), Ting et al.
patent: 6048154 (2000-04-01), Wytman
patent: 6048162 (2000-04-01), Moslehi
patent: 6053980 (2000-04-01), Suda et al.
patent: 6059507 (2000-05-01), Adams
patent: 6062798 (2000-05-01), Muka
patent: 6066210 (2000-05-01), Yonemitsu et al.
patent: 6073366 (2000-06-01), Aswad
patent: 6073828 (2000-06-01), Ma et al.
patent: 6076652 (2000-06-01), Head, III
patent: 6103055 (2000-08-01), Maher et al.
patent: 6125551 (2000-10-01), Bushong et al.
patent: 6126381 (2000-10-01), Bacchi
patent: 6135854 (2000-10-01), Masumura et al.
patent: 6142722 (2000-11-01), Genov et al.
patent: 6146077 (2000-11-01), Shin et al.
patent: 6149379 (2000-11-01), Shin et al.
patent: 6155131 (2000-12-01), Suwa et al.
patent: 6155768 (2000-12-01), Bacchi et al.
patent: 6227793 (2001-05-01), Knighten
patent: 6235634 (2001-05-01), White et al.
patent: 6238161 (2001-05-01), Kirkpatrick et al.
patent: 6242748 (2001-06-01), Gallagher et al.
patent: 6250869 (2001-06-01), Kroeker
patent: 6253464 (2001-07-01), Klebanoff et al.
patent: 6257045 (2001-07-01), Hosokawa et al.
patent: 6257827 (2001-07-01), Hendrickson et al.
patent: 6264748 (2001-07-01), Kuriki et al.
patent: 6267549 (2001-07-01), Brown et al.
patent: 6283355 (2001-09-01), Ma et al.
patent: 6286230 (2001-09-01), White et al.
patent: 6293291 (2001-09-01), Sperlich et al.
patent: 6293749 (2001-09-01), Raaijmakers et al.
patent: 6296735 (2001-10-01), Marxer et al.
patent: 6309161 (2001-10-01), Hofmeister
patent: 6318951 (2001-11-01), Schmidt et al.
patent: 6375746 (2002-04-01), Stevens et al.
patent: 6382895 (2002-05-01), Konishi et al.
patent: 6400115 (2002-06-01), Yamazoe
patent: 6405101 (2002-06-01), Johanson et al.
patent: 6425722 (2002-07-01), Ueda et al.
patent: 6439824 (2002-08-01), Harris et al.
patent: 6440178 (2002-08-01), Berner et al.
patent: 6440261 (2002-08-01), Tepman et al.
patent: 6450750 (2002-09-01), Heyder et al.
patent: 6453214 (2002-09-01), Bacchi et al.
patent: 6467605 (2002-10-01), Head, III
patent: 6485250 (2002-11-01), Hofmeister
patent: 6494666 (2002-12-01), Wu et al.
patent: 6503365 (2003-01-01), Kim et al.
patent: 6506009 (2003-01-01), Nulman et al.
patent: 6514032 (2003-02-01), Saino et al.
patent: 6517304 (2003-02-01), Matsumoto
patent: 6533530 (2003-03-01), Zenpo
patent: 6547510 (2003-04-01), Beaulieu
patent: 6575689 (2003-06-01), Harris
patent: 6592673 (2003-07-01), Welch et al.
patent: 6601888 (2003-08-01), McIlwraith et al.
patent: 6609876 (2003-08-01), Mages et al.
patent: 6618645 (2003-09-01), Bacchi et al.
patent: 6640151 (2003-10-01), Somekh et al.
patent: 6641348 (2003-11-01), Schultz et al.
patent: 6643563 (2003-11-01), Hosek et al.
patent: 6669434 (2003-12-01), Namba et al.
patent: 6678572 (2004-01-01), Oh
patent: 6719516 (2004-04-01), Kroeker
patent: 6719517 (2004-04-01), Beaulieu et al.
patent: 6729824 (2004-05-01), Lei et al.
patent: 6736582 (2004-05-01), Mages et al.
patent: 6744228 (2004-06-01), Cahill et al.
patent: 6758113 (2004-07-01), Choy et al.
patent: 6760976 (2004-07-01), Martinson et al.
patent: 6761085 (2004-07-01), Tan
patent: 6779962 (2004-08-01), Poole
patent: 6813543 (2004-11-01), Aalund et al.
patent: 6837663 (2005-01-01), Mages et al.
patent: 6840732 (2005-01-01), Minami
patent: 6841485 (2005-01-01), Inoue et al.
patent: 6852194 (2005-02-01), Matsushita et al.
patent: 6869263 (2005-03-01), Gilchrist
patent: 6889447 (2005-05-01), Lee et al.
patent: 6898487 (2005-05-01), Bacchi et al.
patent: 6900459 (2005-05-01), Farnworth et al.
patent: 6900877 (2005-05-01), Raaijmakers
patent: 6918731 (2005-07-01), Talmer
patent: 6934606 (2005-08-01), Genetti et al.
patent: 6944584 (2005-09-01), Tenney et al.
patent: 6949143 (2005-09-01), Kurita et al.
patent: 6949844 (2005-09-01), Cahill et al.
patent: 6950716 (2005-09-01), Ward et al.
patent: 6960057 (2005-11-01), Hofmeister
patent: 6976400 (2005-12-01), Tan
patent: 7198448 (2007-04-01), Ozawa et al.
patent: 7210246 (2007-05-01), van der Meulen
patent: 2001/0041120 (2001-11-01), Hofmeister
patent: 2002/0094265 (2002-07-01), Momoki
patent: 2003/0131458 (2003-07-01), Wang et al.
patent: 2004/0151562 (2004-08-01), Hofmeister et al.
patent: 2004/0219001 (2004-11-01), Reimer et al.
patent: 2005/0095087 (2005-05-01), Sullivan et al.
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