Abrading – Accessory – Dressing
Patent
1997-11-06
2000-11-21
Morgan, Eileen P.
Abrading
Accessory
Dressing
451320, 451324, 451444, 451164, B24B 5300
Patent
active
061495123
ABSTRACT:
A linear pad conditioning mechanism provides a linear in situ or ex situ conditioning for a polishing pad mounted on a polishing belt of a CMP apparatus. The linear pad conditioning mechanism includes a linear oscillation mechanism for driving a conditioning pad in a direction orthogonal to the polishing belt's direction of travel. In one example, multiple conditioning assemblies are provided to each provide a trapezoidal conditioning pad, and the conditioning assemblies are positioned such that a constant-width area in the polishing belt's direction of travel is provided. In that example, a rotational mechanism is provided to position the conditioning pad between a conditioning position against the polishing pad, and a cleaning position in a bath of cleaning fluid. Further, each conditioning assembly is provided a fluid delivery system to a conditioner block, so that a conditioner fluid can be delivered at the point of use.
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Anderson H. Alexander
Appel Gregory
Wilson Ethan C.
Aplex Inc.
Kwok Edward C.
Morgan Eileen P.
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