Optics: measuring and testing – Shape or surface configuration
Reexamination Certificate
2009-04-03
2009-12-29
Pham, Hoa Q (Department: 2886)
Optics: measuring and testing
Shape or surface configuration
C356S636000
Reexamination Certificate
active
07639371
ABSTRACT:
This disclosure provides methods for measuring asymmetry of features, such as lines of a diffraction grating. On implementation provides a method of measuring asymmetries in microelectronic devices by directing light at an array of microelectronic features of a microelectronic device. The light illuminates a portion of the array that encompasses the entire length and width of a plurality of the microelectronic features. Light scattered back from the array is detected. One or more characteristics of the back-scattered light may be examined by examining data from the complementary angles of reflection. This can be particularly useful for arrays of small periodic structures for which standard modeling techniques would be impractically complex or take inordinate time.
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Nanometrics Incorporated
Pham Hoa Q
Silicon Valley Patent & Group LLP
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