Line-of-sight deposition method

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4272481, 4272555, C23C 1500

Patent

active

043058019

ABSTRACT:
A line-of-sight method of depositing a film having substantially 100% of theoretical density on a substrate. A pressure vessel contains a target source having a surface thereof capable of emitting particles therefrom and a substrate with the source surface and the substrate surface positioned such that the source surface is substantially parallel to the direction of the particles impinging upon the substrate surface, the distance between the most remote portion of the substrate surface receiving the particles and the source surface emitting the particles in a direction parallel to the substrate surface being relatively small. The pressure in the vessel is maintained less than about 5 microns to prevent scattering and permit line-of-sight deposition. By this method the angles of incidence of the particles impinging upon the substrate surface are in the range of from about 45.degree. to 90.degree. even when the target surface area is greatly expanded to increase the deposition rate.

REFERENCES:
patent: 3494852 (1970-02-01), Doctoroff
patent: 3494853 (1970-02-01), Anderson et al.
patent: 3654123 (1972-04-01), Hajzak
patent: 3669860 (1972-06-01), Knowles et al.
patent: 3711398 (1973-01-01), Clarke
patent: 3761375 (1973-09-01), Pierce et al.
patent: 3779891 (1973-12-01), Vegh et al.
patent: 3829373 (1974-08-01), Kuehnle
patent: 3925187 (1975-12-01), Bernard
patent: 3939052 (1976-02-01), Riley
patent: 4014779 (1977-03-01), Kuehnle
patent: 4022947 (1977-05-01), Grubb et al.
patent: 4119881 (1978-10-01), Calderon
J. W. Patten, "The Influences of Surface Topography and Angle of Adatom Incidence on Growth Structure in Sputtered Chromium," Thin Solid Films, vol. 63, pp. 121-129 (1979).
Y. Hoshi et al., "High Rate Deposition of Iron Films By Sputtering from Two Facing Targets," Japan J. Appl. Phys., vol. 16, pp. 1715-1716 (1977).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Line-of-sight deposition method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Line-of-sight deposition method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Line-of-sight deposition method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1902941

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.