Limiting orifice drying medium, apparatus therefor, and cellulos

Drying and gas or vapor contact with solids – Process – Gas or vapor contact with treated material

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

34116, 442 6, 442 45, 442203, 442212, 442255, 428198, F26B 300

Patent

active

061052760

ABSTRACT:
A limiting orifice through-air-drying medium for papermaking or other absorbent embryonic webs. The medium may be used in an apparatus which can be embodied in a cover and a roll. The medium has the unique combination of a relatively high bending fatigue strength and relatively low pressure drop. The medium may comprise a laminate of a plurality of plies. The intermediate plies of the laminate may be woven with a square weave. The medium may also be used for other types of drying.

REFERENCES:
patent: Re28459 (1975-07-01), Cole et al.
patent: 4172910 (1979-10-01), Rotar
patent: 4251928 (1981-02-01), Rotar et al.
patent: 4329201 (1982-05-01), Bolton
patent: 4528239 (1985-07-01), Trokhan
patent: 4556450 (1985-12-01), Chuang et al.
patent: 4583302 (1986-04-01), Smith
patent: 4637859 (1987-01-01), Trokhan
patent: 4888096 (1989-12-01), Cowan et al.
patent: 4921750 (1990-05-01), Todd
patent: 4942675 (1990-07-01), Sundovist
patent: 4973385 (1990-11-01), Jean et al.
patent: 5274930 (1994-01-01), Ensign et al.
patent: 5581906 (1996-12-01), Ensign et al.
patent: 5598643 (1997-02-01), Chuang et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Limiting orifice drying medium, apparatus therefor, and cellulos does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Limiting orifice drying medium, apparatus therefor, and cellulos, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Limiting orifice drying medium, apparatus therefor, and cellulos will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-567772

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.