Light tunnel retention and adjustment apparatus

Optical waveguides – Accessories

Reexamination Certificate

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C385S147000, C353S122000

Reexamination Certificate

active

07076145

ABSTRACT:
A light tunnel retention and adjustment mechanism for retaining and aligning a light tunnel in a light tunnel assembly. The light tunnel retention and adjustment mechanism includes one or more first compliant spring fingers that interface with the light tunnel along a first surface to provide a compliant spring force for adjusting alignment of the light tunnel in a first axis and fixedly retaining the light tunnel in position in the first axis. The light tunnel retention and adjustment mechanism further includes one or more second compliant spring fingers that interface with the light tunnel along a second surface and provide a compliant spring force for adjusting alignment of the light tunnel in a second axis and fixedly retaining the light tunnel in position in the second axis. The light tunnel retention and adjustment mechanism may be formed as a single piece.

REFERENCES:
patent: 5538509 (1996-07-01), Dunlap et al.
patent: 6156275 (2000-12-01), Dumitrescu et al.
patent: 6364493 (2002-04-01), Kakuta et al.
patent: 6773118 (2004-08-01), Lee
patent: 2004/0090598 (2004-05-01), Morinaga
patent: 2005/0024601 (2005-02-01), Morinaga
Patent Abstracts of Japan for Publication No. 2000182528, published Jun. 30, 2000 for Mitsubishi Electric Corp. (English Language Abstract).
Patent Abstracts of Japan for Publication No. 2003177468, published Jun. 27, 2003 for Tamron Co. Ltd. (English Language Abstract).
International Search Report for PCT/US2005/014620 dated Jul. 27, 2005.
Written Opinion of the International Searching Authority for PCT/US2005/014620 dated Jul. 27, 2005 for Infocus Corporation.

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