Light transmissive films

Details Light transmissive films Light transmissive films

2008-01-15

2008-01-15

Bashore, Alain L. (Department: 1762)

Coating processes

Optical element produced

C427S164000, C427S167000, C428S423300

Reexamination Certificate

active

10914019

ABSTRACT:
A thin film of zinc oxide is deposited by sputter deposition in a partial pressure of oxygen on a suitable at a low temperature, such as less than 300 degrees Centigrade, to provide an amorphous film. This should take place in a sputtering environment which will produce an oxygen deficient film layer. After this, the film is crystallized by heat treatment in an oxygen free environment in a given temperature range. The thin film produced by this process will have very low electrical resistance, is transparent from about the visible to beyond 10 microns in wavelength, is highly resistant to laser energy and is highly conductive.

REFERENCES:
patent: 4415602 (1983-11-01), Brodie et al.
patent: 4939043 (1990-07-01), Biricik et al.
patent: 5236632 (1993-08-01), Ogawa et al.
patent: 5324365 (1994-06-01), Niwa

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