Light source for reduced projection

Details Light source for reduced projection Light source for reduced projection

1987-01-20

1989-08-08

Sikes, William L.

Coherent light generators

Particular resonant cavity

Specified cavity component

372 57, 372 99, 372103, 372108, H01S 303

Patent

active

048560189

ABSTRACT:
A reduced projection light source comprises a laser device for emitting laser light having a transverse mode of multimodes, and an etalon located between a chamber of the laser device and a total reflection mirror. The light source is used as an exposure light source for transfer printing an ultrafine pattern on a semiconductor wafer.

REFERENCES:
patent: 3919665 (1975-11-01), Schmidt
patent: 4683576 (1987-07-01), Nagashima et al.
patent: 4689794 (1987-08-01), Brosnan
Fua et al.; "Laser output . . . Etalons"; Optics and Laser Technology; Apr. 1975; vol. 7, No. 2; pp. 63-64.
LEEB; "Losses Introduced . . . Etalons"; Applied Physics; 6, No. 2; pp. 267-272; Mar., 1975.
"0.4 . . . "; News Review; Nikrei Microdevices; 5/1986; pp. 50-51.
Goldhar et al.; "An Injection . . . Quality"; IEEE Journal of Quantum Electronics, vol. AE16, No. 2, 02/1980.
Harris et al.; "Wide Band . . . EO.sub.2 Laser"; Optics Communications; vol. 16, No. 1; 01/1976; pp. 57-62.

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