Light-sensitive vesicular recording materials and process of usi

Details Light-sensitive vesicular recording materials and process of usi Light-sensitive vesicular recording materials and process of usi

1979-02-05

1980-07-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Vesicular process

430155, 430176, 430192, 430197, 430290, G03C 160, G03C 176, G03C 534

Patent

active

042151910

ABSTRACT:
Vesicular recording materials include a sensitized layer which comprises a polymeric vehicle for the sensitizing agent which is a copolymer of 62 to 95 mole % of acrylonitrile or a derivative thereof with acrylamide or a derivative thereof. Preferred copolymers are derived from acrylonitrile and N-tert.butyl acrylamide or diacetone acrylamide. The sensitized layers may contain a surfactant and may be subjected to water treatment.

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patent: 3779774 (1973-12-01), Cope et al.
patent: 3841874 (1974-10-01), Nishino
patent: 4019909 (1977-04-01), Cohen et al.

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