Light-sensitive trisester of O-quinone diazide containing compos

Details Light-sensitive trisester of O-quinone diazide containing compos Light-sensitive trisester of O-quinone diazide containing compos

1985-02-28

1986-05-13

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430166, 430192, 430193, 430326, 534556, 534561, G03C 154, G03C 160, G03C 176

Patent

active

045886709

ABSTRACT:
A light sensitive composition for the preparation of a positive acting photoresist which is a mixture of an alkali soluble resin and a compound of the formula ##STR1## wherein X is a naphthoquinone-(1,2)-diazide-(2)-sulfonyl residue.

REFERENCES:
patent: 3201239 (1965-08-01), Neugebauer
patent: 3666473 (1972-05-01), Colom et al.
patent: 4115128 (1978-09-01), Kita
patent: 4174222 (1979-11-01), Komine et al.
patent: 4407926 (1983-10-01), Stahlhofer
patent: 4409314 (1983-10-01), Buhr et al.
patent: 4499171 (1985-02-01), Hosaka et al.

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