Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Two or more radiation-sensitive layers containing other than...
Patent
1989-12-15
1991-06-11
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Two or more radiation-sensitive layers containing other than...
430556, 430557, G03C 736, G03C 738
Patent
active
050231693
ABSTRACT:
A silver halide light-sensitive color photographic material which is capable of forming a dye image of improved spectral absorption characteristic, resulting in the improved color reproducibility as well as in the image preservability and which has a high maximum density is disclosed. The material comprises a green-sensitive silver halide emulsion layer containing a magenta coupler having the following Formula [M-I], ##STR1## wherein Z, X and R is as defined in the description; and a blue-sensitive silver halide emulsion layer contains a yellow coupler having the following Formula [Y-I]; ##STR2## wherein R.sub.21, R.sub.22, R.sub.23, n, R.sub.24, J and X.sub.1 are respectively as defined in the description.
REFERENCES:
patent: 4286053 (1981-08-01), Ishikawa et al.
patent: 4356258 (1982-10-01), Usui et al.
patent: 4404274 (1983-09-01), Arai et al.
patent: 4443536 (1984-04-01), Lestina
patent: 4513082 (1985-04-01), Furutachi et al.
patent: 4607002 (1986-08-01), Nakayama et al.
patent: 4622287 (1986-11-01), Umemoto et al.
patent: 4748100 (1988-05-01), Umemoto et al.
Hirabayashi Shigeto
Mizukura Noboru
Tsuruta Mayumi
Konica Corporation
Schilling Richard L.
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