Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1984-09-13
1985-12-10
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430155, 430166, 430523, 430537, 430950, 430961, G03C 152
Patent
active
045579946
ABSTRACT:
A light-sensitive printing plate is disclosed. The printing plate is comprised of a support base having a light-sensitive layer positioned thereon and a matting layer comprised of a micropattern of protuberances. The protuberances are present in a regular or randomly mixed manner on the light-sensitive layer and are comprised of a copolymer. The copolymer includes a monomer (unit a) with a sulfonic acid group, a monomer (unit b) selected from the group consisting of alkyl acrylates having 1 to 10 carbon atoms in the alkyl moiety thereof and alkyl methacrylates having 4 to 10 carbon atoms in the alkyl moiety thereof and a monomer (unit c) copolymerizable with monomer (unit a) and monomer (unit b), monomer (unit c) as a copolymer having a glass transition point of 60.degree. C. or above. The matting layer does not cause staining of a film original when superposed thereon and is resistant to rubbing or pressure and provides a surface which can be vacuum contacted with a film in a short period of time.
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Nagano Teruo
Nakakita Eiji
Sekiya Toshiyuki
Brammer Jack P.
Fuji Photo Film Co. , Ltd.
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