Light-sensitive positive working, o-guinone diazide presensitize

Details Light-sensitive positive working, o-guinone diazide presensitize Light-sensitive positive working, o-guinone diazide presensitize

1987-02-11

1989-07-04

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430193, 430302, 430166, G03C 194, G03C 160, G03F 708

Patent

active

048450081

ABSTRACT:
A positive-working light-sensitive composition is herein disclosed, which comprises a mixed organic solvent consisting of (i) at least one organic solvent having a boiling point of at least 40.degree. C. and less than 100.degree. C., (ii) at least one organic solvent having a boiling point of at least 100.degree. C. and less than 140.degree. C., and (iii) at least one organic solvent having a boiling point of at least 140.degree. C. and less than 210.degree. C.; or (a) at least one organic solvent as defined in the above item (i), (b) at least one organic solvent as defined in the item (ii), (c) at least one organic solvent having a boiling point of at least 210.degree. C., and optionally at least one solvent as defined in the item (iii), based on the total weight of the mixed solvent, the composition making it possible to extremely reduce load for drying and to impart excellent properties such as development latitude to the resultant light-sensitive layer and the composition being useful to produce PS plates according to a continuous process.

REFERENCES:
patent: 4350753 (1982-09-01), Shelnut et al.
patent: 4395527 (1987-07-01), Berger
patent: 4487823 (1984-12-01), Lehmann et al.
patent: 4550069 (1985-10-01), Pampalone
patent: 4626491 (1986-12-01), Gray
patent: 4626492 (1986-12-01), Eilbeck
patent: 4659642 (1987-04-01), Platzer et al.
patent: 4672021 (1987-06-01), Blumel et al.
patent: 4732836 (1988-03-01), Potiur et al.

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