Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1984-04-24
1986-01-21
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430197, 430270, 430283, 430325, 430330, 430919, 430927, 260349, G03C 171, G03F 726
Patent
active
045657670
ABSTRACT:
A light-sensitive polymer composition comprising a poly(amic acid), a special bisazide compound and an amine compound can give a film which has high sensitivity and in which portions exposed to light are not easily released by a developing solution at the time of development.
REFERENCES:
patent: 2940853 (1960-06-01), Sagura et al.
patent: 3475176 (1969-10-01), Rauner
patent: 3539559 (1970-11-01), Ruckert
patent: 3714194 (1973-01-01), Ulrich
patent: 4092442 (1978-05-01), Agnihotri et al.
patent: 4093461 (1978-06-01), Loprest et al.
patent: 4139390 (1979-02-01), Rauner et al.
patent: 4243743 (1981-01-01), Hiramoto et al.
patent: 4310641 (1982-01-01), Ohmura et al.
patent: 4311785 (1982-01-01), Ahne et al.
patent: 4321319 (1982-03-01), Shoji et al.
patent: 4356247 (1982-10-01), Aotani et al.
patent: 4451551 (1981-12-01), Kataoka et al.
Chemical Abstracts, vol. 95, #159904f, 1981, (Hitachi--Japanese Kokai-81-024,344, 3/1981).
Isogai Tokio
Kataoka Fumio
Kojima Mitsumasa
Obara Isao
Shoji Fusaji
Bowers Jr. Charles L.
Hitachi Chemical Company Ltd.
Hitachi Ltd
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