Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1976-12-02
1980-12-23
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
20415914, 20415915, 521 60, 521 61, 536 56, 536102, 430287, G03C 168, G03C 152, C12P 3310
Patent
active
042411629
ABSTRACT:
This invention relates to light sensitive photoresist materials which are used in the photo-engraving process or in the production of the phosphor screens of color picture tubes. The light sensitive photoresist materials of this invention are novel, water-soluble azide materials.
REFERENCES:
patent: 2751373 (1956-06-01), Unrah et al.
patent: 2787546 (1957-04-01), Smith et al.
patent: 2882161 (1959-04-01), Dann et al.
patent: 3033782 (1962-05-01), Rauch et al.
patent: 3321309 (1967-05-01), Retchel
patent: 3817757 (1974-06-01), Yabe et al.
patent: 3821167 (1974-06-01), Asano et al.
Hashimoto Michiaki
Hatano Yoshio
Kohashi Takahiro
Nonogaki Saburo
Brammer Jack P.
Hitachi , Ltd.
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