Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-07-15
1992-10-06
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430157, 430176, 430270, 430281, 430284, 430286, 430287, 430906, 430910, G03F 7021, G03F 7027, G03F 7032
Patent
active
051530953
ABSTRACT:
A light-sensitive composition comprises (A) a polymer comprising structural units represented by the following general formula (I): ##STR1## (wherein R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents a hydrogen atom, an alkyl group or an aryl group; and Z represents a bivalent connecting group having at least 3 non-metallic atoms in the main chain); (B) a monomer or an oligomer having at least two polymerizable ethylenically unsaturatred double bonds; and (C) a photopolymerization initiator. The light-sensitive composition has high sensitivity and is excellent in stability of sensitivities such as storage stability, temperature dependency and latent image sensitization.
REFERENCES:
patent: 3458311 (1969-07-01), Alles
patent: 4511645 (1985-04-01), Koike et al.
patent: 4687727 (1987-08-01), Toyama et al.
Imai Masanori
Kawamura Kouichi
Sano Hiromichi
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
Young Christopher G.
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