Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1987-11-12
1990-02-06
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430166, 430167, 430190, 430192, 430193, 430270, 430302, 430326, G03C 160, G03C 154, G03C 1495
Patent
active
048988030
ABSTRACT:
A light-sensitive composition comprises at least one polyuretane resin having repeating unit represented by formula (I) and/or repeating unit represented by formula (II) and which is insoluble in water and soluble in aqueous alkaline solution; and at least one positive-working light-sensitive compound: ##STR1## wherein R.sub.1 represents a bivalent aliphatic or aromatic hydrocarbon which may have a substituent; R.sub.2 represents hydrogen atom or an alkyl, an aralkyl, an aryl, an alkoxy or an aryloxy group which may be substituted with a substituent; R.sub.3, R.sub.4 and R.sub.5 may be the same or different and independently represent a single bond or a bivalent aliphatic or aromatic hydrocarbon group which may have a substituent and Ar represents a trivalent aromatic hydrocarbon group which may have a substituent. The composition has good coating properties and makes it possible to impart excellent wear resistance and printing durability to the resultant light-sensitive products such as PS plates, print-circuit boards, photomasks and the like.
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Aoai Toshiaki
Aoshima Keitaro
Nagashima Akira
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
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