Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1988-07-11
1990-09-25
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430190, 430192, 430193, 430326, 430330, G03C 160, G03F 7023
Patent
active
049592920
ABSTRACT:
A phenolic novolak resin comprising the product of a condensation reaction of an aldehyde comprising a haloacetaldehyde source or a mixture of a haloacetaldehyde source and a formaldehyde source with a phenolic monomer comprising at least one compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are individually selected from hydrogen or a one to four carbon alkyl group and wherein the ratio of total carbon atoms in the sum of R.sub.1, R.sub.2 and R.sub.3 to the total number of phenolic nuclei in said resin is from about 0.5:1 to about 1.5:1 in the presence of a solvent; said resin made by employing a molar ratio of total aldehyde to total phenolic monomers from about 0.33:1 to about 0.70:1. These phenolic resins are suitable for use in light-sensitive compositions (e.g. positive-working photoresists).
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English Abstract of Japanese Pat. Pub. #85-008023, Published 2/28/85 (Mitsui Petrochem. Ind. K.K.).
Pampalone, T. R., Solid State Technology, 6/1984, pp. 115-120.
Hiraoka, H., ACS Symposium Series No. 266, 1984, pp. 339-359.
Blakeney Andrew J.
Sarubbi Thomas
Sizensky Joseph J.
Bowers Jr. Charles L.
Olin Hunt Specialty Products Inc.
Simons William A.
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