Light-sensitive negative working composition with diazonium cond

Details Light-sensitive negative working composition with diazonium cond Light-sensitive negative working composition with diazonium cond

1985-03-07

1987-07-21

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430176, 430905, 430910, G03C 160

Patent

active

046818332

ABSTRACT:
A light-sensitive composition is described, containing: (A) a light-sensitive diazo compound, (B) a combination of Polymer (B-1) and Polymer (B-2), and (C) an epoxy resin. Polymer (B-1) is a polymer having the structural units of the general formulae (i), (ii) and (iii). Polymer (B-2) is a polymer having the structural units of the general formulae (iv), (v) and (vi). ##STR1## wherein R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is an unsubstituted or substituted benzyl group, a lower alkyl group, or a halogen-substituted lower alkyl group, R.sup.3 is a hydrogen atom, a lower alkyl group, or a halogen-substituted lower alkyl group, R.sup.4 is a tert- or iso-butyl group, and R.sup.5 is a lower alkyl group. This composition is a negative-type light-sensitive composition and is used to prepare a lithographic printing plate, for example. This printing plate is superior in lipophilic nature and also in mechanical properties such as abrasion resistance.

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