Light-sensitive mixture comprising O-naphthoquinone-diazides and

Details Light-sensitive mixture comprising O-naphthoquinone-diazides and Light-sensitive mixture comprising O-naphthoquinone-diazides and

1981-11-12

1983-10-04

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

260141, 430190, 430192, 430193, G03C 154, C07C11300

Patent

active

044079265

ABSTRACT:
A light-sensitive composition, especially suitable for preparation of planographic printing plates, comprising a water-insoluble resinous binder which is soluble or swellable in aqueous alkaline solutions, and a naphthoquinonediazide sulfonic acid ester of the general formula I ##STR1## wherein D represents a 1,2-naphthoquinone-2-diazide-4-sulfonyl or 1,2-naphthoquinone-2-diazide-5-sulfonyl radical and R represents an alkyl or aryl radical. Printing plates produced with such compositions exhibit good resistance to aqueous alkaline developers, alcohol-containing moistening liquids and gasoline hydrocarbons.

REFERENCES:
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patent: 3635709 (1972-01-01), Kobayashi
patent: 3802885 (1974-04-01), Lawson et al.
patent: 4105450 (1978-08-01), Schinozaki et al.
patent: 4197128 (1980-04-01), Watanabe et al.
patent: 4275139 (1981-01-01), Stahlhofen
patent: 4306011 (1981-12-01), Uehara et al.
Chemical Abstracts, vol. 70, #78637, 1969, (Fedorov et al.).
Fredericks, E. C. et al., IBM Tech. Discl. Bulletin, vol. 19, No. 11, p. 4193, 4/1977.

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