Light-sensitive mixture based on O-naphthoquinone-diazides, and

Details Light-sensitive mixture based on O-naphthoquinone-diazides, and Light-sensitive mixture based on O-naphthoquinone-diazides, and

1982-06-23

1985-05-14

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, 430259, 430302, 430308, 430326, 430309, 534557, G03F 708, G03C 154, C07C11300

Patent

active

045172757

ABSTRACT:
A light-sensitive mixture is described, which is specially intended for the production of planographic printing plates and which contains, as the light-sensitive compound, a naphthoquinonediazide sulfonic acid ester of the general formula I ##STR1## in which D is the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical or the 1,2-naphthoquinone-2-diazide-4-sulfonyl radical, preferably the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, R and R' are hydrogen atoms, alkyl groups having 1 to 4 carbon atoms or radicals of the formula DO, and n denotes an integer from 6 to 18, preferably from 8 to 14. The new compounds are distinguished by good solubility and produce layers which have a high resistance to alkaline developer solutions and to damping solution containing alcohol.

REFERENCES:
patent: 3046118 (1962-07-01), Schmidt
patent: 3188210 (1965-06-01), Fritz et al.
patent: 3647443 (1972-03-01), Rauner et al.
patent: 4266001 (1981-05-01), Buhr et al.
patent: 4407926 (1983-10-01), Stahlhofen
patent: 4409314 (1983-10-01), Buhr et al.

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