Light-sensitive mixture based on O-naphthoquinone diazide ester

Details Light-sensitive mixture based on O-naphthoquinone diazide ester Light-sensitive mixture based on O-naphthoquinone diazide ester

1982-06-30

1984-03-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, 430302, 260141, G03C 154, G03C 160

Patent

active

044395116

ABSTRACT:
A light-sensitive mixture is described, which contains, as the light-sensitive compound, a 1,2-naphthoquinone-2-diazidesulfonic acid ester of the general formula I ##STR1## in which R and R' denote hydrogen atoms or lower alkyl groups, X denotes a saturated alkylene, hydroxyalkylene or dihydroxyalkylene group having 6 to 18 carbon atoms, D denotes the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical or the 1,2-naphthoquinone-2-diazide-4-sulfonyl radical and n denotes a number from 1 to 20. The new quinone diazides produce printing plates which are capable of long printing runs and have good resistance to developer and good flexibility of the printing stencil.

REFERENCES:
patent: 3046118 (1962-07-01), Schmidt
patent: 3046120 (1962-07-01), Schmidt et al.
patent: 3188210 (1965-06-01), Fritz et al.
patent: 3647443 (1972-03-01), Rauner et al.
patent: 4266001 (1981-05-01), Buhr et al.
patent: 4306011 (1981-12-01), Uehara et al.
patent: 4308368 (1981-12-01), Kubo et al.

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