Light-sensitive mixture

Details Light-sensitive mixture Light-sensitive mixture

1979-06-25

1981-05-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, 430326, 260141, G03C 154, C07C11300

Patent

active

042660017

ABSTRACT:
A positive-working light-sensitive mixture for the preparation of printing plates, in particular planographic printing plates, and photoresists is described, which comprises an alkali-soluble binder, preferably a novolak, and an o-naphthoquinone diazide of the formula ##STR1## in which R.sub.1, R.sub.1 ', R.sub.2 and R.sub.2 ' are identical or different and represent hydrogen, chlorine or bromine atoms, alkyl, alkoxy or alkoxyalkyl groups having 1 to 6 carbon atoms or alkenyl groups having 2 to 6 carbon atoms, R.sub.3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R.sub.4 represents a hydrogen atom, an optionally substituted alkyl group, the carbon chain of which can be interrupted by ether oxygen atoms, an optionally substituted cycloalkyl group having 5 to 16 carbon atoms or an optionally substituted alkenyl group having 2 to 16 carbon atoms, n represents zero or an integer from 1 to 4 and D represents a 1,2-naphthoquinone-2-diazide-sulfonyl group. The new naphthoquinone diazides are distinguished by a high solubility in organic solvents and by good reprographic properties.

REFERENCES:
patent: 3046110 (1962-07-01), Schmidt
patent: 3046118 (1962-07-01), Schmidt
patent: 3130049 (1964-04-01), Neugebauer et al.
patent: 3188210 (1965-06-01), Fritz et al.
patent: 3640992 (1972-02-01), Sus et al.
patent: 3669658 (1972-06-01), Yonezawa et al.
patent: 3785825 (1974-01-01), Deutsch et al.
patent: 4005437 (1977-01-01), Ross et al.
patent: 4157918 (1979-06-01), Wanat et al.

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