Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-05-13
1995-06-13
Rutledge, D.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204109, G03D 302
Patent
active
054247993
ABSTRACT:
A light-sensitive material treating apparatus which is small in size and produces a reduced quantity of waste fluid. A current conduction process is applied to a developing solution using an auxiliary tank communicated with a developing tank and to which a supplementary solution is supplied. The developing solution contains a developing agent which is oxidized to an oxidation state by reaction with silver halide and reduced to a reduction state by electronation. The auxiliary tank is separated into two chambers by a cation-exchange membrane, and a cathode and an anode are provided in respective ones of the chambers arranged opposite to each other with respect to the cation-exchange membrane. A current is applied between the two electrodes. The current conduction time is controlled on the basis of current conduction efficiency corresponding to the time of use.
REFERENCES:
patent: 4217188 (1980-08-01), Ono
Nakamura Takashi
Ogawa Yasuhisa
Fuji Photo Film Co. , Ltd.
Rutledge D.
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