Light-sensitive diazotype material with 2-hydroxy-3-naphthoic ac

Details Light-sensitive diazotype material with 2-hydroxy-3-naphthoic ac Light-sensitive diazotype material with 2-hydroxy-3-naphthoic ac

1979-03-16

1982-06-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430 8, 430172, 430173, 430174, 430150, 430171, 430180, 430183, 544159, 544 581, 260239BF, 546206, 546 86, 548542, G03C 158, G03C 154

Patent

active

043340040

ABSTRACT:
This invention relates to 2-hydroxy-3-naphthoic acid amides of the general formula: ##STR1## wherein R.sub.1 is hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, and R.sub.2 and R.sub.3 are identical or different and are hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, or, together with the nitrogen atom to which they are attached, a substituted or unsubstituted heterocyclic group.

REFERENCES:
patent: 2233038 (1941-02-01), Sus et al.
patent: 2278444 (1942-10-01), Weissberger et al.
patent: 2537098 (1951-01-01), Slifkin et al.
patent: 2970909 (1961-02-01), Slimowicz
patent: 3113025 (1963-12-01), Bialczak
patent: 3272627 (1966-09-01), Sus et al.
patent: 3367776 (1968-02-01), Bialczak et al.
patent: 3406071 (1968-10-01), Sus et al.
Kosar, J., "Light-Sensitive Systems", J. Wiley & Sons, 1965, pp. 220, and 234-239.

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