Light-sensitive diazonium resin mixture and light-sensitive diaz

Details Light-sensitive diazonium resin mixture and light-sensitive diaz Light-sensitive diazonium resin mixture and light-sensitive diaz

1987-05-22

1989-05-09

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430176, 430177, 430302, 430309, 430330, G03C 160

Patent

active

048289590

ABSTRACT:
A light-sensitive mixture that contains a diazonium salt polycondensation product, a polymeric binder and an organic peroxide which has a scorch temperature of at least 100.degree. C. and, above this temperaure, is capable of forming free radicals is especially useful for the preparation of planographic printing plates, the print run of which can be extended by burning-in the exposed and developed plate. The light-sensitive mixture has a long storage life in the dark.

REFERENCES:
patent: 3544320 (1970-12-01), Yamada et al.
patent: 3660097 (1972-05-01), Mainthia
patent: 3867147 (1975-02-01), Teuscher
patent: 4259430 (1981-03-01), Kaplan et al.
patent: 4289838 (1981-09-01), Rowe et al.
patent: 4387151 (1983-06-01), Bosse
patent: 4564580 (1986-01-01), Ichimura et al.
patent: 4631245 (1986-12-01), Pawlowski et al.
patent: 4659645 (1987-04-01), Frommeld et al.
patent: 4749639 (1988-07-01), Frommeld
G. T. Elie et al., IBM Technical Disclosure Bulletin, "Photoresist Cross-Linked with a Thermal Free-Radical Initiator for use as an Ion Implant Mask", vol. 17, No. 1, Jun. 1974, p. 85.
J. M. Mayone, IBM Technical Disclosure Bulletin, "Vacuum Bake Photoresist Preparation for High-Energy, High-Dose Ion Implantation", vol. 18, No. 3, Aug. 1975, pp. 788.

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