Light-sensitive diazo resin composition containing a higher fatt

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430157, 430176, 430177, 430179, 430281, 430287, G03F 7021, G03F 7027, G03C 161

Patent

active

050809997

ABSTRACT:
A light-sensitive composition which comprises, (a) an ethylenically unsaturated addition polymerizable compound, (b) an alkaline water-soluble or swellable, and film-forming polymer, (c) a photopolymerization initiator, (d) a negative working diazo resin, and (e) at least one compound selected from the group consisting of a higher fatty acid and a higher fatty acid amide which are solid at ordinary temperatures.
The light-sensitive composition is hardly influenced by oxygen and is suitable for a presensitized plate from which a printing plate is to be prepared.

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patent: 4294905 (1981-10-01), Okishi et al.
patent: 4298679 (1981-11-01), Shinozaki et al.
patent: 4411983 (1983-10-01), Washizawa et al.
patent: 4511645 (1985-04-01), Koike et al.

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