Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-05-28
1992-01-14
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430157, 430176, 430177, 430179, 430281, 430287, G03F 7021, G03F 7027, G03C 161
Patent
active
050809997
ABSTRACT:
A light-sensitive composition which comprises, (a) an ethylenically unsaturated addition polymerizable compound, (b) an alkaline water-soluble or swellable, and film-forming polymer, (c) a photopolymerization initiator, (d) a negative working diazo resin, and (e) at least one compound selected from the group consisting of a higher fatty acid and a higher fatty acid amide which are solid at ordinary temperatures.
The light-sensitive composition is hardly influenced by oxygen and is suitable for a presensitized plate from which a printing plate is to be prepared.
REFERENCES:
patent: 3396020 (1968-06-01), Borchers
patent: 4250007 (1981-02-01), Yasuno et al.
patent: 4289838 (1981-09-01), Rowe et al.
patent: 4292392 (1981-09-01), Ikeda et al.
patent: 4294905 (1981-10-01), Okishi et al.
patent: 4298679 (1981-11-01), Shinozaki et al.
patent: 4411983 (1983-10-01), Washizawa et al.
patent: 4511645 (1985-04-01), Koike et al.
Higashi Tatsuji
Imai Masanori
Kita Nobuyuki
Koike Mitsuru
Watanabe Noriaki
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
Young Christopher G.
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