Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1984-06-01
1986-10-14
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430176, 430177, 430178, 430179, 430157, 430302, G03C 160, G03C 154, G03F 708
Patent
active
046172505
ABSTRACT:
A light-sensitive composition for use with lithographic printing plates is described which comprises (1) a light-sensitive, organic solvent soluble and substantially water-insoluble diazo resin which is the reaction product of a water-soluble, light-sensitive condensate of an aromatic diazonium compound and an organic condensing agent with a halogenated Lewis acid or a salt thereof, (2) a substantially water-insoluble, film forming organic high-molecular weight compound having an acid value of from 10 to 200, (3) a polynuclear aromatic sulfonic acid or a salt thereof, and (4) a salt-forming organic dye compound.
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Kita Nobuyuki
Koike Akinobu
Misu Hiroshi
Nakakita Eiji
Sekiya Toshiyuki
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
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