Light-sensitive copying material with o-quinone diazide and phen

Details Light-sensitive copying material with o-quinone diazide and phen Light-sensitive copying material with o-quinone diazide and phen

1984-08-17

1986-06-10

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430192, 430302, G03C 160, G03C 194, G03F 708

Patent

active

045943060

ABSTRACT:
This invention relates to an improvement in a light-sensitive copying material comprising a carrier and a light-sensitive copying layer which contains, as the light-sensitive compound, an o-quinone diazide sulfonic acid ester or an o-quinone diazide sulfonic acid amide, the improvement being that the layer also contains a compound with an aromatic or aliphatic hydroxy group which is capable of forming chelate compounds.

REFERENCES:
patent: 2859112 (1958-11-01), Sus et al.
patent: 3046115 (1962-07-01), Schmidt et al.
patent: 3061430 (1962-10-01), Uhlig et al.
patent: 3102809 (1963-09-01), Endermann et al.
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 3130049 (1964-04-01), Neugebauer et al.
patent: 3148983 (1964-09-01), Endermann et al.
patent: 3180733 (1965-04-01), Neugebauer et al.
patent: 3264104 (1966-08-01), Reichel
patent: 4009033 (1977-02-01), Bakus et al.
Dinaburg, Photosensitive Diazo Compounds and Their Uses, The Focal Press, 1964, pp. 182-192.

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