Light-sensitive compounds, light-sensitive mixture, and light-se

Details Light-sensitive compounds, light-sensitive mixture, and light-se Light-sensitive compounds, light-sensitive mixture, and light-se

1981-10-20

1983-10-11

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

260141, 430193, 430326, 430330, G03C 160, G03C 154, C07C11300

Patent

active

044093144

ABSTRACT:
A light-sensitive mixture is described which contains a water-insoluble resinous binder, which is soluble or swellable in aqueous-alkaline solutions, and a novel 1,2-naphthoquinone-2-diazide-sulfonic acid ester of a dihydroxyacylophenone or of a dihydroxybenzoic acid ester of the formula I ##STR1## in which R.sup.1 is an alkyl or alkoxy radical, the carbon chain of which can be interrupted by ether oxygen atoms, R.sup.2 is a hydrogen atom, an alkyl radical having 1-3 carbon atoms, or a chlorine or bromine atom and D is a 1,2-naphthoquinone-2-diazide-sulfonyl radical. The copying materials prepared from this mixture are particularly suitable for the preparation of printing plates which give long print runs and have a high light sensitivity. The compounds of the formula I are distinguished by good solubility in customary coating solvents.

REFERENCES:
patent: 3046118 (1962-07-01), Schmidt
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 3130047 (1964-04-01), Uhlig et al.
patent: 3635709 (1972-01-01), Kobayashi
patent: 3802885 (1974-04-01), Lawson et al.
patent: 4005437 (1977-01-01), Ross et al.
patent: 4174222 (1979-11-01), Komine et al.

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