Light-sensitive compound, light-sensitive mixture, and light-sen

Details Light-sensitive compound, light-sensitive mixture, and light-sen Light-sensitive compound, light-sensitive mixture, and light-sen

1981-10-20

1987-01-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, 430302, 430326, 534557, G03C 154, G03C 194, G07C11300

Patent

active

046394060

ABSTRACT:
A light-sensitive copying material for the preparation of printing plates and photoresists is described, which material contains, as the light-sensitive compound, a naphthoquinone-diazide-sulfonic acid ester of the general formula I ##STR1## in which D is a 1,2-naphthoquinone-2-diazide-4-sulfonyl radical or a 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, R.sub.1 is a hydrogen atom or a --COC.sub.n H.sub.2n+1 radial, and R.sub.2 is a hydrogen atom or a --CO--OC.sub.n H.sub.2n+1 radial, n being a number from 10 to 25 and the sum of the carbon atoms of R.sub.1 +R.sub.2 being n+1.
The new quinone-diazides are distinguished by a higher solubility and a greater resistance to developer.

REFERENCES:
patent: 3635709 (1972-01-01), Kobayashi
patent: 4036644 (1977-07-01), Kaplan
patent: 4174222 (1979-11-01), Komine et al.
patent: 4266001 (1981-05-01), Buhr et al.

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