Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-01-08
1993-08-31
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430176, 430281, 430283, 430284, 430285, 430927, G03F 7021, G03C 160
Patent
active
052408086
ABSTRACT:
A light-sensitive composition which comprises at least one polymeric compound having both photocross-linkable groups and functional groups carrying P--OH bonds. The light-sensitive composition can effectively be employed for making lithographic printing plates, IC circuits and photomasks. The light-sensitive composition shows excellent practically acceptable developability with either of an aqueous alkali developer and an aqueous alkaline solution containing or free of organic substances such as organic solvents and/or surfacants. Moreover, when it is used to form PS plates, the resulting lithographic printing plates never cause background contamination and can provide a large number of good printed matters. The composition makes it possible to develop negative working PS plates with developers for positive working PS plates. Therefore, when both positive and negative working PS plates are processed, the use of the composition can save various troubles.
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Aoshima Keitaro
Imai Masanori
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
Young Christopher G.
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