Light-sensitive compositions and light-sensitive materials with

Details Light-sensitive compositions and light-sensitive materials with Light-sensitive compositions and light-sensitive materials with

1987-10-14

1989-06-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430176, 430190, 430192, 430197, 430270, 430281, 430286, 430287, 430302, G03C 160, G03C 168, G03C 1495

Patent

active

048429830

ABSTRACT:
A light-sensitive composition comprising a phenolic resol wherein the ratio of the number of dibenzylic ether linkages to the total number of dibenzylic ether, methylene and methylol linkages linked to phenolic nucleus is 15 mol. % or more and which is obtained by a reaction between a phenol of the formul (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 may be the same or different and represent hydrogen, halogen, hydroxyl, nitro, alkyl, alkoxy, phenyl, or substituted phenyl, and an aldehyde or ketone.
A light-sensitive composition comprising a condensate of the phenolic resol and an o-quinone diazido sulfonylhalide.
A light-sensitive material comprising the above-mentioned composition.
A method for making a planographic printing plate from the light-sensitive material, characterized in that burning-in process is carried out at a lower temperature or a shortened time.

REFERENCES:
patent: 3485797 (1969-12-01), Robins
patent: 3635709 (1972-01-01), Kobayashi
patent: 3666473 (1972-05-01), Colom et al.
patent: 3676392 (1972-07-01), Robins
patent: 4079031 (1978-03-01), Sardessai et al.
patent: 4536464 (1985-08-01), Nagashima et al.
patent: 4612254 (1986-09-01), Ginter et al.

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