Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1980-10-27
1982-10-26
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430196, 430285, 430286, 430287, 430919, 430920, 430926, 430927, 430197, G03C 171
Patent
active
043562477
ABSTRACT:
A light-sensitive composition particularly suitable for making light-sensitive lithographic printing plates is described composed of a mixture of a sensitizer and a photo-crosslinkable polymer, or a mixture of a sensitizer, a compound including a light-sensitive azido group and a polymer reactive with a decomposate of azido groups to be formed upon exposure to light, and a sensitizer represented by the formula (I) ##STR1## wherein A represents a non-metallic atomic group necessary for forming a heterocyclic ring containing nitrogen; R.sub.1 represents an alkyl group or a substituted alkyl group; R.sub.2 represents hydrogen, an alkyl group, a substituted alkyl group, an aryl group, or a substituted aryl group; and Y and Z each represents an oxygen atom or a sulfur atom.
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Langford, J. F., et al., Research Disclosure, 3/1977, #15568.
Aotani Yoshimasa
Kojima Teruo
Nakakita Eiji
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
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