Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1987-01-14
1988-09-27
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430163, 430176, G03C 154, G03C 160
Patent
active
047741619
ABSTRACT:
The present invention relates to a light-sensitive composition comprising a modified polyvinyl acetal resin having a substituent possessing an acid hydrogen atom introduced into remaining hydroxy groups of a polyvinyl acetal resin in an amount of from 0.1 to 6 milliequivalents as acid content per 1 gram resin, and a diazo resin represented by the formula (I) ##STR1## wherein R.sub.1 represents a hydrogen atom, or a substituted or unsubstituted alkyl, alkoxy, hydroxy, carboxyester or carboxy group; R.sub.2 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms or a phenyl group; R.sub.3 represents a hydrogen atom or an alkoxy group having 1 to 3 carbon atoms; R.sub.4 represents an alkyl group having 6 to 18 carbon atoms; n represents an integer not smaller than 2.
The presensitized lithographic printing plate using the light-sensitive composition of the present invention can be developed with an alkali developer and the highlight image thereof is tough. The lithographic printing plate obtained from the presensitized plate has increased press life.
REFERENCES:
patent: 3396019 (1968-06-01), Uhlig
patent: 3790556 (1974-02-01), Doggett
patent: 4123276 (1978-10-01), Kita et al.
patent: 4467027 (1984-08-01), Yamamoto et al.
patent: 4631245 (1986-12-01), Pawlowski
Aoai Roahiaki
Kamiya Akihiko
Maemoto Kazuo
Sekiya Toshiyuki
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
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